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2.3.2.1.3 III-V semiconductors

Chapter Concepts

Substances /
Molecular Formulas
GaAs (110); GaAs (111); GaAs(001)...(133); GaAs(100); GaAs(100)...(113); GaAs(100)2x4/c(2x8); GaAs(100)v; GaAs(110)v; GaAs(111)...(113); GaAs(111)...(133); GaAs(111)v; GaAs(112); GaAs(113); GaAs(115); GaAs(117); GaAs(122); GaAs(133)
Element Systems As-Ga
Properties LEED; Miller index; atomic displacement; coordination number; coordination type; interplanar spacing; lattice parameter; space group; step-height; surface orientation; surface structure
Substrates solid surfaces

Source

Title

2.3.2.1.3 III-V semiconductors

In

2.3.2.1 Experimentally observed stabile of surfaces, stepped surfaces

Author H. Henzler, W. Ranke
Part of Landolt-Börnstein - Group III Condensed Matter
Numerical Data and Functional Relationships in Science and Technology
Volume

24a: Structure

Edited by G. Chiarotti
Chapter-DOI 10.1007/10031427_49
Book-DOI 10.1007/b41604 (Volume in Bookshelf)

Cite as

RIS-Export Henzler, H., Ranke, W.: 2.3.2.1.3 III-V semiconductors. Chiarotti, G. (ed.). SpringerMaterials - The Landolt-Börnstein Database (http://www.springermaterials.com). DOI: 10.1007/10031427_49

Abstract

2.3.2.1.3 III-V semiconductors in '2.3.2.1 Experimentally observed stabile of surfaces, stepped surfaces', part of 'Landolt-Börnstein - Group III Condensed Matter: Numerical Data and Functional Relationships in Science and Technology, Volume 24a: Structure'.
This chapter compiles data of experimentally observed stability of different orientations of GaAs III-V semiconductors. Miller index, angle from LIP, azimuth, zone, preparation, methods, remarks, results, and structural data of the GaAs are tabulated. The methods include N-DIC-microscopy, scanning-EM, RHEED, STM, REM, HR-LEED. The chapter also contains some graphs: (i) monomolecular (bilayer) steps, decorated, on a (001) facet of a GaAs LPE layer, (ii) orientation dependence of the ionization threshold for the surface of a cylindrical GaAs crystal prepared by molecular beam epitaxy (MBE), ion bombardment and annealing (IBA) and ion bombardment without annealing (IB), (iii) STM images of the steps on GaAs (001) vicinal surfaces, (iv) REM micrograph of a GaAs (001) surface, revealing an atomic step emerging from a screw dislocation, (v) STM image of trigonal islands of (111) bilayer height of GaAs.